Modelling and simulation of OVD deposition process for optical fiber preform
thesis
posted on 2024-05-19, 21:22authored byJUN HE
This thesis presents a numerical investigation into the multiphase flow of SiCl4/O2/H2 during the OVD process. An innovative OVD process model has been successfully developed using the Eulerian-Eulerian approach. The model has been enhanced to incorporate the nucleation and growth of SiO2 particles. Various operating, geometric, and burner-related parameters have been examined. The findings demonstrate the existence of optimal conditions, such as the ideal raw gas flow rate, resulting in the highest deposition efficiency. Overall, numerical studies using our developed model provide a deeper understanding of the OVD system and valuable insights into the process optimization and quality control.
History
Principal supervisor
Aibing Yu
Additional supervisor 1
Wenqi Zhong
Additional supervisor 2
Minshu Zhan
Year of Award
2024
Department, School or Centre
Chemical & Biological Engineering
Additional Institution or Organisation
SEU-Monash joint research institute, Suzhou, China
Course
Doctor of Philosophy (Southeast University - Monash)